Company // Innovations

Christine Thayer on Technology Transfer, Dry Etch and the 2020 Women Tech Awards

By Rebecca Lewington - 2020-09-22

Micron’s engineers and scientists routinely overcome or simply ignore the laws of physics when it comes to making the nanometer-scale devices that compose cutting-edge memory and storage chips.

Christine Thayer, senior dry etch process engineer in the Advanced Development Technology Group, is a prime example. Her team is responsible for bringing new memory technologies from research and development to high-volume manufacturing, with a particular focus on “dry etch.” Dry etch is the process by which circuit features are made using a heady cocktail of reactive gases in strong magnetic and electric fields to selectively remove material from the wafer surface with incredible precision.

Christine has just been recognized as a finalist for the 2020 Women Tech Awards, along with 22 other women advancing technology. This is very cool and well deserved — in talking to her peers about her, words like “fantastic” and “amazing” keep coming up.


Christine somehow finds time to give back. She co-founded the Micron Utah Women’s Employee Resource Group, she serves on the Mentoring Committee of Micron’s Technical Leadership Program, and she has been tirelessly involved in many diversity, equality and inclusion efforts — all to the benefit of the entire organization.

Watch our video with Christine and learn how our amazing team is building the technologies that are changing the world for the better. And if you’re seeking to join Micron’s team and help change the world, learn more at

Rebecca Lewington

Rebecca Lewington

Technology Evangelist, Global Corporate Marketing and Corporate Communications
Rebecca is responsible for telling Micron’s technology story to show how fractally innovative our people are and how we’re enabling the world to harness data to accelerate exploration and discovery. Based in California, she holds a master’s degree in engineering from the University of London and has been granted 15 patents in the field of semiconductor plasma etch manufacturing systems.